semiconductor / news / / The Economic Times
US bill to limit China's access to advanced chipmaking equipment has been modified.
The MATCH Act's revised version narrows restrictions but still blocks ASML DUV immersion lithography exports to China.
KEY POINTS
- Countrywide curbs on cryogenic etch tools from Lam Research and Tokyo Electron were removed from the bill.
- The new draft requires licenses for servicing chipmaking equipment in restricted Chinese facilities but dropped blanket denial policies.
- The bill sets a deadline for diplomatic negotiations with allies before imposing unilateral US controls.
COMPANIES
Summarized by Newsio from The Economic Times. How we summarize →